The MOCVD (Metal-Organic Chemical Vapor Deposition) Systems

We are equipped with three commercial III-nitride MOCVD reactors, which are dedicated to the development of III-nitride devices. They are capable of simultaneously producing 1 piece of 6-inch (or 7 pieces of 2-inch) III-nitride wafers. Our laboratory is also equipped with two home-built metal organic chemical vapor deposition (MOCVD) reactors, which can produce half of 2-inch wafers. The typical room temperature electron concentration and mobility of our undoped 3-micron GaN epilyers are about 5×10¹⁶cm^-3 and 700 cm²/Vs, respectively.

Safety Operation Procedures
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