The Optical Experiment
- Picosecond Laser Spectroscopy Equipment Facility: This state-of-the-art facility is used to measure picosecond time-resolved photoluminescence and optical properties of semiconductors from infrared (IR) to ultraviolet (UV) spectral region. The system consists of
- a picosecond (8 ps pulse width) dye laser driven by a Nd:YAG laser with a frequency doubler;
- a frequency doubler for the dye laser to provide a tunability in the UV region (285 - 310 nm) with an average power of 50 mW; a frequency tripler for the YAG laser to provide a 100 ps laser source at 355 nm with an average power of 1 W;
- a closed-cycle He refrigerator with temperature range between 10 - 850 K;
- a 1.3-m monochromator with gratings operating in the region from 185 nm - 800 nm;
- a 0.5 m monochromator with a grating operating in the region of 800 nm - 3000 nm;
- a streak camera detection system (2 picosecond time resolution) operating in the region of 185 - 800 nm;
- a microchannel plate photo-multiplier tube and a single photon counting detection system (25 ps time-resolution) operating in the region of 185 - 800 nm;
- a microchannel plate photo-multiplier tube and a single photon counting detection system (25 ps time-resolution) operating in the region of 800 nm - 1300 nm;
- an auto-correlator and a sampling scope (< 100 ps rise time) for monitoring YAG and dye laser pulse shape and UV optics and ultra fast pin photo-diodes.
- Femtosecond Laser System: A complete frequency Quadrupled Ti-Sapphire femtosecond laser system. This laser system is specifically designed to generate femtosecond tunable deep UV (195-200 nm) laser light source with 10 mW average power. This laser system together with our current detection system is the world’s first deep UV (λ > 195 nm) picosecond time-resolved optical measurement facilities dedicated to III-nitride semiconductor research and allows us to measure optical processes in AlGaN with AlN fraction all the way up to 100%.
Near-Field-Scanning-Optical-Microscopy (NSOM) System
Our deep UV femtosecond laser is also integrated with a UV NSOM/AFM system for imaging optical patterns with a spatial resoultion of 100 nm. The NSOM/AFM system is also capable of imaging non-destructively semiconductor film resistivity, capacitance, and defects with a 100 nm spacial resolution.
Safety Operation Procedures
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